Metal mesh electrode array fabricated by plate-to-roll nanoimprint lithography

A review of roll-to-roll nanoimprint lithography

UNLABELLED Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands...

Metal hierarchical patterning by direct nanoimprint lithography

Three-dimensional hierarchical patterning of metals is of paramount importance in diverse fields involving photonics, controlling surface wettability and wearable electronics. Conventionally, this type of structuring is tedious and usually involves layer-by-layer lithographic patterning. Here, we describe a simple process of direct nanoimprint lithography using palladium benzylthiolate, a versa...

Solid state microcavity dye lasers fabricated by nanoimprint lithography

High-Speed Roll-to-Roll Nanoimprint Lithography on Flexible Plastic Substrates**

The ability of microto nanometer-scale patterning on flexible substrates can enable many new applications in the area of photonics and organic electronics. A major roadblock has remained for many practical applications of patterned nanostructures, which is the throughput of nanopattern replication and the associated cost issues. Among the emerging techniques, nanoimprint lithography (NIL) clear...

Zone-plate-array Lithography (zpal)

Nanolithography is the key technology driving technological progress in electronics, photonics, information technology and biotechnology. The tools and techniques used in the semiconductor industry have become too expensive for applications other than high-volume manufacturing. Masks, which are required for each unique design, can cost tens of thousands of dollars per layer. This economic const...